Low-macroscopic field emission from carbon fibers synthesized by direct current plasma enhanced chemical vapour deposition

Abstract

Carbon fibers, in thin film form, have been synthesized on Si substrates via direct current plasma enhanced chemical vapour deposition with acetylene as a precursor using Ni as a catalyst at substrate temperature 750-850°C. X-ray diffraction studies confirmed the graphitic phase of the carbon fibers. Surface morphologies of the films have been studied by a scanning electron microscope and an atomic force microscope. The graphitic carbon fibers have showed good field emission properties with a turn-on field lying in the range 2.57-9.71 V/<img src='/image/spc_char/micro.gif' border=0> m for films deposited with different substrate temperatures. The field enhancement factor and the approximate work function have also been calculated. The emission properties have been studied for different anode-sample spacing for the carbon fibers film deposited at 850°C.