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Indian Journal of Pure & Applied Physics (IJPAP) >
IJPAP Vol.42 [2004] >
IJPAP Vol.42(12) [December 2004] >
| Title: | Study of copper-silicon junctions fabricated by selective electroless deposition |
| Authors: | Dhingra, Sunil
Arora, Sanjiv
George, P J |
| Keywords: | Copper-silicon junctions
Electroless deposition
Metal semiconductor |
| Issue Date: | Dec-2004 |
| Publisher: | CSIR |
| IPC Code: | H01L |
| Abstract: | The metal
semiconductor contacts have been fabricated by electroless deposition of copper
on chemically cleaned p-type silicon
and their characteristics studied. A continuous thin film of good quality and
adhesion is formed. The values of barrier height and the ideality factor are
found to be comparable to those of vacuum evaporated contacts. The barrier
heights measured from I-V and C-V characteristics are
also found to be comparable. |
| Page(s): | 916-920 |
| ISSN: | 0975-1041 (Online); 0019-5596 (Print) |
| Source: | IJPAP Vol.42(12) [December 2004]
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