Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/9604
Title: Effect of grain size on the mobility and transfer characteristics of polysilicon thin-film transistors
Authors: Gupta, Navneet
Tyagi, B P
Keywords: Mobility
Polysilicon thin-film transistors
Grain size
Issue Date: Jul-2004
Publisher: CSIR
Series/Report no.: H01L 27/00
Abstract: The effect of the grain size on the effective carrier mobility (eff) and transfer characteristics of a polycrystalline silicon thin-film transistor (poly-Si TFT) have been theoretically investigated by developing an analytical model. The dependence of eff is studied as a function of doping concentrations and gate voltage for different values of grain size. It is observed that at low as well as at high doping concentrations, the effective carrier mobility (eff) increases with increase in grain size, whereas the observed dip at the intermediate doping concentration is getting confirmed. The effect of the grain size on transfer characteristics of poly-Si TFT in its linear region is also presented. It is found that at low gate voltages, eff and ID increase rapidly with the increase in VG for all values of grain sizes due to the grain boundary barrier lowering effect. At high gate voltage the grain boundary barrier lowering effect becomes insignificant and causes the saturation of eff and ID. The model was found to account correctly for the experimentally observed mobility variation and yield a reasonably good agreement.
Description: 528-532
URI: http://hdl.handle.net/123456789/9604
ISSN: 0975-1041 (Online); 0019-5596 (Print)
Appears in Collections:IJPAP Vol.42(07) [July 2004]

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