|
NISCAIR ONLINE PERIODICALS REPOSITORY (NOPR) >
NISCAIR PUBLICATIONS >
Research Journals >
Indian Journal of Pure & Applied Physics (IJPAP) >
IJPAP Vol.48 [2010] >
IJPAP Vol.48(06) [June 2010] >
| Title: | Structural, electrical and optical behaviour of rf magnetron sputtered cuprous oxide films |
| Authors: | Reddy, M Hari Prasad
Reddy, P Narayana
Uthanna, S |
| Keywords: | Cuprous oxide
Magnetron sputtering
Structure
Electrical properties
Optical properties |
| Issue Date: | Jun-2010 |
| Publisher: | CSIR |
| Abstract: | Thin films of
cuprous oxide have been deposited on glass substrates by sputtering of copper
target at different substrate temperatures in the range 303-523 K and at oxygen
partial pressure of 2×10-2 Pa using rf magnetron sputtering method. The deposited films
are characterised by studying crystallographic structure with X-ray
diffraction, surface morphology by atomic force microscopy, and electrical and
optical properties. The effect of substrate temperature on the physical
properties of the deposited films has been systematically studied. The films
deposited at 303 K are found amorphous while those formed at higher
temperatures are polycrystalline with improved crystallinity. The electrical
resistivity of the films decreases from 29 to 8 Ω cm and optical band gap
increases from 2.15 to 2.32 eV with the increase of substrate temperature from
303 to 523 K. |
| Page(s): | 420-424 |
| ISSN: | 0975-1041 (Online); 0019-5596 (Print) |
| Source: | IJPAP Vol.48(06) [June 2010]
|
|
