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|Title:||Structural, electrical and optical behaviour of <i>rf</i> magnetron sputtered cuprous oxide films|
|Authors:||Reddy, M Hari Prasad|
Reddy, P Narayana
|Abstract:||Thin films of cuprous oxide have been deposited on glass substrates by sputtering of copper target at different substrate temperatures in the range 303-523 K and at oxygen partial pressure of 2×10<sup>-2</sup> Pa using <i>rf</i> magnetron sputtering method. The deposited films are characterised by studying crystallographic structure with X-ray diffraction, surface morphology by atomic force microscopy, and electrical and optical properties. The effect of substrate temperature on the physical properties of the deposited films has been systematically studied. The films deposited at 303 K are found amorphous while those formed at higher temperatures are polycrystalline with improved crystallinity. The electrical resistivity of the films decreases from 29 to 8 Ω cm and optical band gap increases from 2.15 to 2.32 eV with the increase of substrate temperature from 303 to 523 K.|
|ISSN:||0975-1041 (Online); 0019-5596 (Print)|
|Appears in Collections:||IJPAP Vol.48(06) [June 2010]|
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