Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/8414
Title: Silica-on-silicon based 1<img src='/image/spc_char/cross.gif' border=0>N optical splitter: Design, fabrication and characterization
Authors: Baby, Aji
Dhanavantri, C
Pachauri, J P
Johri, S
Kumar, Pawan
Singh, B R
Issue Date: Feb-2005
Publisher: CSIR
Series/Report no.: H 01 R 31/02
Abstract: The present paper deals with the design, fabrication technology and performance of silica-on-silicon based 1<img src='/image/spc_char/cross.gif' border=0>4 and 1<img src='/image/spc_char/cross.gif' border=0>8 optical power splitter. The basic waveguide structure with S-bends and Y-junctions have been used for the splitter design using BPM software. The optimized process parameters related to choice of metal masking layer, chemistry used for deep dry etching of core layer, dependence of etch process parameters on anisotropy and sidewall smoothness, dicing and fibre alignment are presented. An indigenously built ECR/RIE system especially for deep dry etching of silica layer is also described. The results on splitting insertion loss and uniformity maximum across the channel measured on 1<img src='/image/spc_char/cross.gif' border=0>4 and 1<img src='/image/spc_char/cross.gif' border=0>8 splitters are presented.
Description: 12-16
URI: http://hdl.handle.net/123456789/8414
ISSN: 0975-1017 (Online); 0971-4588 (Print)
Appears in Collections:IJEMS Vol.12(1) [February 2005]

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