Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/8348
Title: Low-macroscopic field emission from carbon fibers synthesized by direct current plasma enhanced chemical vapour deposition
Authors: Ahmed, Sk F
Das, S
Mitra, M K
Chattopadhyay, K K
Keywords: Carbon fibers;Thin film;Field emission;Plasma
Issue Date: Sep-2006
Publisher: CSIR
IPC Code: C03C
Abstract: Carbon fibers, in thin film form, have been synthesized on Si substrates via direct current plasma enhanced chemical vapour deposition with acetylene as a precursor using Ni as a catalyst at substrate temperature 750-850°C. X-ray diffraction studies confirmed the graphitic phase of the carbon fibers. Surface morphologies of the films have been studied by a scanning electron microscope and an atomic force microscope. The graphitic carbon fibers have showed good field emission properties with a turn-on field lying in the range 2.57-9.71 V/ m for films deposited with different substrate temperatures. The field enhancement factor and the approximate work function have also been calculated. The emission properties have been studied for different anode-sample spacing for the carbon fibers film deposited at 850°C.
Page(s): 700-704
URI: http://hdl.handle.net/123456789/8348
ISSN: 0975-1041 (Online); 0019-5596 (Print)
Appears in Collections:IJPAP Vol.44(09) [September 2006]

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