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Indian Journal of Pure & Applied Physics (IJPAP) >
IJPAP Vol.44 [2006] >
IJPAP Vol.44(09) [September 2006] >
| Title: | Low-macroscopic field emission from carbon fibers synthesized by direct current plasma enhanced chemical vapour deposition |
| Authors: | Ahmed, Sk F
Das, S
Mitra, M K
Chattopadhyay, K K |
| Keywords: | Carbon fibers
Thin film
Field emission
Plasma |
| Issue Date: | Sep-2006 |
| Publisher: | CSIR |
| IPC Code: | C03C |
| Abstract: | Carbon fibers,
in thin film form, have been synthesized on Si substrates via direct current
plasma enhanced chemical vapour deposition with acetylene as a precursor using
Ni as a catalyst at substrate temperature 750-850°C. X-ray diffraction studies confirmed the graphitic phase of the
carbon fibers. Surface morphologies of the films have been studied by a
scanning electron microscope and an atomic force microscope. The graphitic
carbon fibers have showed good field emission properties with a turn-on field
lying in the range 2.57-9.71 V/ m for
films deposited with different substrate temperatures. The field enhancement
factor and the approximate work function have also been calculated. The
emission properties have been studied for different anode-sample spacing for the carbon fibers film deposited at 850°C. |
| Page(s): | 700-704 |
| ISSN: | 0975-1041 (Online); 0019-5596 (Print) |
| Source: | IJPAP Vol.44(09) [September 2006]
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