Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/8239
Title: Surface chemical etching behaviour of pristine and high energy Li ion irradiated kapton-H polyimide
Authors: Garg, Maneesha
Sharma, Anu
Quamara, J K
Keywords: Surface chemical etching
High energy heavy ion irradiation
Kapton-H polyimide
Issue Date: Jan-2006
Publisher: CSIR
Series/Report no.: C08J3/28
Abstract:  High energy heavy ion irradiation effect on surface chemical etching behaviour of kapton-H polyimide has been studied using NaOH (40°C) and NaOCl (55°C) as etchants. The samples have been irradiated with 50 MeV Li ions (fluence 105 ions/cm2 at Pelletron Facility, Nuclear Science Center, New Delhi). The etching behaviour is non-linear in NaOH for both pristine and irradiated samples. There is an enhancement in the etching rate in irradiated samples for both NaOH and NaOCl etchants. The etching mechanism of pristine and irradiated kapton-H polyimide with NaOCl and NaOH has been investigated. In irradiated samples the demerization of carbonyl groups, breaking of imide linkages and increase in crystallinity have been held responsible for the change in the etching behaviour. The bulk activation energy of pristine and irradiated samples for NaOH (0.38 and 0.30 eV) and NaOCl (1.6 and 1.3 eV) has been estimated. High temperature vacuum annealed samples when etched with NaOH show swelling instead of etching, which is due to a unique type of gel formation taking place on the surface.
Description: 66-70
URI: http://hdl.handle.net/123456789/8239
ISSN: 0975-1041 (Online); 0019-5596 (Print)
Appears in Collections:IJPAP Vol.44(01) [January 2006]

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