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Indian Journal of Pure & Applied Physics (IJPAP) >
IJPAP Vol.44 [2006] >
IJPAP Vol.44(01) [January 2006] >
| Title: | Surface chemical etching behaviour of pristine and high energy Li ion irradiated kapton-H polyimide |
| Authors: | Garg, Maneesha
Sharma, Anu
Quamara, J K |
| Keywords: | Surface chemical etching
High energy heavy ion irradiation
Kapton-H polyimide |
| Issue Date: | Jan-2006 |
| Publisher: | CSIR |
| IPC Code: | C08J3/28 |
| Abstract: |
High energy heavy
ion irradiation effect on surface chemical etching behaviour of kapton-H
polyimide has been studied using NaOH (40°C) and NaOCl (55°C) as etchants. The
samples have been irradiated with 50 MeV Li ions (fluence 105
ions/cm2 at Pelletron Facility, Nuclear
Science Center,
New Delhi). The
etching behaviour is non-linear in NaOH for both pristine and irradiated
samples. There is an enhancement in the etching rate in irradiated samples for
both NaOH and NaOCl etchants. The etching mechanism of pristine and irradiated
kapton-H polyimide with NaOCl and NaOH has been investigated. In irradiated
samples the demerization of carbonyl groups, breaking of imide linkages and
increase in crystallinity have been held responsible for the change in the
etching behaviour. The bulk activation energy of pristine and irradiated
samples for NaOH (0.38 and 0.30 eV) and NaOCl (1.6 and 1.3 eV) has been
estimated. High temperature vacuum annealed samples when etched with NaOH show
swelling instead of etching, which is due to a unique type of gel formation
taking place on the surface.
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| Page(s): | 66-70 |
| ISSN: | 0975-1041 (Online); 0019-5596 (Print) |
| Source: | IJPAP Vol.44(01) [January 2006]
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