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Research Journals >
Indian Journal of Engineering and Materials Sciences (IJEMS) >
IJEMS Vol.16 [2009] >
IJEMS Vol.16(5) [October 2009] >
| Title: | Growth and characterization of tetravalent doped LiCoO2 thin film cathodes |
| Authors: | Rao, M C
Hussain, O M |
| Keywords: | Ti doped LiCoO2 PLD films
XRD
AFM
Raman and electrochemical |
| Issue Date: | Oct-2009 |
| Publisher: | CSIR |
| Abstract: | Titanium-doped LiCoO2 thin films
are grown by pulsed laser deposition technique on silicon substrates.
Structure, AFM, FTIR and Raman are studied with respect to their deposition
parameters, i.e., substrate temperature (Ts)
and oxygen partial pressure (pO2) in the deposition chamber. The
films deposited in pO2 = 100 mTorr showed good crystallinity on
silicon substrates maintained at Ts
= 700°C. It is found that such a film crystallizes in the layered  -NaFeO2 structure. The influence of
titanium doping on particle size and morphologies has been clearly
studied. FTIR spectra displayed the characteristic IR
dominant bands at 246 and 550 cm–1 for titanium doped LiCoO2 thin
films. The Raman peaks observed for the films at
594 cm-1 and 485 cm-1 are ascribed to Raman active modes
A1g and Eg respectively. The electrochemical
measurements were carried out on Li//LiTiyCo1-yO2
cells. The Li//LiTiyCo1-yO2
cell delivered a specific capacity of 225 mC/ m cm2. The influence of titanium doping on the
structural and electrochemical properties has been systematically studied. |
| Page(s): | 335-340 |
| ISSN: | 0975-1017 (Online); 0971-4588 (Print) |
| Source: | IJEMS Vol.16(5) [October 2009]
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