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Title: Growth and characterization of tetravalent doped LiCoO<sub>2 </sub>thin film cathodes
Authors: Rao, M C
Hussain, O M
Keywords: Ti doped LiCoO<sub>2</sub> PLD films
Raman and electrochemical
Issue Date: Oct-2009
Publisher: CSIR
Abstract: Titanium-doped LiCoO<sub>2 </sub>thin films are grown by pulsed laser deposition technique on silicon substrates. Structure, AFM, FTIR and Raman are studied with respect to their deposition parameters, i.e., substrate temperature (<i style="">T</i><sub>s</sub>) and oxygen partial pressure (pO<sub>2</sub>) in the deposition chamber. The films deposited in pO<sub>2</sub> = 100 mTorr showed good crystallinity on silicon substrates maintained at <i style="">T</i><sub>s</sub> = 700°C. It is found that such a film crystallizes in the layered <img src='/image/spc_char/alpha.gif'>-NaFeO<sub>2</sub> structure. The influence of titanium<sub> </sub>doping on particle size and morphologies has been clearly studied. FTIR spectra displayed the characteristic IR dominant bands at 246 and 550 cm<sup>–1 </sup>for titanium doped LiCoO<sub>2 </sub>thin films. The Raman peaks observed for the films at 594 cm<sup>-1</sup> and 485 cm<sup>-1</sup> are ascribed to Raman active modes A<sub>1g</sub> and E<sub>g</sub> respectively. The electrochemical measurements were carried out on Li//LiTi<sub>y</sub>Co<sub>1-y</sub>O<sub>2</sub> cells. The Li//LiTi<sub>y</sub>Co<sub>1-y</sub>O<sub>2</sub> cell delivered a specific capacity of 225 mC/<img src='/image/spc_char/micro.gif'>m cm<sup>2</sup>. The influence of titanium<sub> </sub>doping on the structural and electrochemical properties has been systematically studied.
Description: 335-340
ISSN: 0975-1017 (Online); 0971-4588 (Print)
Appears in Collections:IJEMS Vol.16(5) [October 2009]

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