Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/549
Title: Growth and characterization of copper, indium and copper-indium alloy films non-aqueous method of electrodeposition
Authors: Kumar, S R
Prajapati, B
Tiwari, S K
Tiwari, V K
Keywords: Non-aqueous medium;Electrodeposition;Cathodic polarization;Stoichiometry;Survey scans;Sputtering
Issue Date: Mar-2008
Publisher: CSIR
Abstract: A new non-aqueous method for electrodeposition of copper, indium and copper indium alloy films, ethylene glycol has been used as the solvent which is non-toxic and non-hazard bath. All the source materials are readily soluble in this bath and they have higher working temperature (≥160°C). The copper films prepared in ethylene glycol based bath are preferred (111) oriented with grains well connected to each other indicates the epitaxial growth. The indium film has been observed in semi-molten state with intense (101) reflection. The Cu-In alloy film prepares at –1.1 V (Pt) is copper rich but the ratio tends to be1.0 in the bulk of the film. Multiphase deposits are observed with grains which are spherical and well connected to each other. The resistivity and carrier concentration of the as-deposited copper and copper indium alloy films are found to be 0.2 Ω-cm, 9.9x10¹⁵ per cm³ and 2.5 Ω-cm and 5.5x10¹⁷per cm³, respectively. The as-deposited films are found to be resistive but the resistance decreases when the films are annealed at moderate temperature.
Page(s): 198-203
URI: http://hdl.handle.net/123456789/549
ISSN: 0019-5596
Appears in Collections:IJPAP Vol.46(03) [March 2008]

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