Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/54705
Title: A Study on the Misallocation Effect of Capital Combination on China’s High-tech Industry
Authors: Cao, Hui
Chen, Chu
Wang, Kuan
Keywords: Capital combination;R&D expenditure;Non-R&D activity;Misallocation Effect
Issue Date: May-2020
Publisher: NISCAIR-CSIR, India
Abstract: This paper aims to investigate the misallocation effect of different capital combinations accumulated from R&D and non-R&D activity in China’s high-tech industry. Using a conceptual model, the study first establishes an equilibrium combination derived from the firm’s behavior, and then analyzes the misallocation situation in China’s high-tech industry from 2003–2016. The findings indicate that the misallocation effect becomes clearer in the Chinese high-tech industry as input increases, and increased non-R&D activity worsens the misallocation.
Page(s): 387-390
URI: http://nopr.niscair.res.in/handle/123456789/54705
ISSN: 0975-1084 (Online); 0022-4456 (Print)
Appears in Collections:JSIR Vol.79(05) [May 2020]

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