Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/45400
Title: Molecular analysis of fenazaquin selected resistant strain of two-spotted spider mite Tetranychus urticae Koch
Authors: Sharma, Rakesh Kumar
Bhullar, Manmeet Brar
Singh, Satnam
Jindal, Vikas
Keywords: Fenazaquin resistance;Two spotted spider mite;Tetranychus urticae
Issue Date: Oct-2018
Publisher: NISCAIR-CSIR, India
Abstract: The two-spotted spider mite, Tetranychus urticae Koch (Acari: Tetranychidae) is an important agricultural pest in a wide range of outdoor and protected crops worldwide. Fenazaquin is mitochondrial electron transport inhibition (METI)-acaricide and its extensive and frequent use for control of this mite has facilitated resistance development. So, present studies were conducted to investigate genetic differences between fenazaquin resistant and susceptible population of T. urticae as no information is available regarding mutation/variability in genes involved in imparting resistance. Fenazaquin selected resistant population was developed in the laboratory by giving selection pressure for up to 15 generations which resulted into 166.49 fold increase in resistance level when compared with susceptible population. Molecular analysis of resistant and susceptible population revealed no changes in genes structure of CYP392A11 and CYP392A12 in the resistant compared to the susceptible population. However, expression profiling of nine different genes associated (CYP392A11, CYP392A12, CYP392A16, CYP392D2, CYP392D3, CYP392D6, CYP392D7, CYP392D8 and CYP392D10p) with METI resistance showed increased mRNA transcripts in CYP392A11, CYP392A12, CYP392D2 and CYP392D10p. The increased MFO activity in the resistant population corresponds to nearly two fold increase in the expression of CYP392A11 and CYP392A12. The target site mutation might not have any role in low to moderate level of fenazaquin resistance in mites. Differences in mRNA expression are a simple, fast and reliable tool for early detection of resistance.
Page(s): 602-610
URI: http://nopr.niscair.res.in/handle/123456789/45400
ISSN: 0975-0967 (Online); 0972-5849 (Print)
Appears in Collections:IJBT Vol.17(4) [October 2018]

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