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Title: Scattering due to Cylindrical Plasmas Excited by the Ring of Electric Currents
Authors: Sharma, Subhash Chandra
Verma, J S
Issue Date: Sep-1977
Publisher: NISCAIR-CSIR, India
Abstract: Scatterings due to semiconductor and gaseous plasmas are studied with the excitation source as the ring of electric currents. Increase in the radius of gaseous plasma causes an appreciable increase in the scattering field magnitude. In the direction 90° to the axis of the cylindrical plasmas the magnitude is quite high. The backward radiations also undergo the same effect. The computed values for scattering field due to both semiconductor and gaseous plasmas for different permittivity’s show a moderate increase except at 5° (scattering due to gaseous plasma). Thus, the density change in both the plasma columns causes the enhancement of the scattering magnitude.
Page(s): 178-179
ISSN: 0975-105X (Online); 0367-8393 (Print)
Appears in Collections:IJRSP Vol.06(3) [September 1977]

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