Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/35419
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dc.contributor.authorTripathi, Ravi Kant-
dc.contributor.authorPanwar, Omvir Singh-
dc.contributor.authorChockalingam, Sreekumar-
dc.date.accessioned2016-09-16T09:51:34Z-
dc.date.available2016-09-16T09:51:34Z-
dc.date.issued2016-09-
dc.identifier.issn0975-1041 (Online); 0019-5596 (Print)-
dc.identifier.urihttp://nopr.niscair.res.in/handle/123456789/35419-
dc.description543-550en_US
dc.description.abstractThis paper reports the improved nanomechanical properties of as grown and nitrogen incorporated tetrahedral amorphous carbon (ta-C, ta-C: N) films deposited by S-bend filtered cathodic vacuum arc (FCVA) technique using nanoindentation. The effect of varying amount of nitrogen incorporation on the nanomechanical properties of ta-C films deposited at a high substrate bias of -300 V at ultra low load of 1.4 mN has been studied. It has been found that the nitrogenation has improved the mechanical properties of ta-C films. The hardness H of 27.8 GPa with improvement of ~30 % and plastic index parameter (ratio of H to elastic modulus E) (H/E) of 0.091 with improvement of ~ 25 % has been obtained for ta-C: N films deposited at a nitrogen partial pressure of 1.9x10-2 Pa. Improved H and H/E of ta-C: N films may be due to the better ionization and incorporation of nitrogen in a carbon matrix at the high negative substrate bias used in the deposition of FCVA technique.en_US
dc.language.isoen_USen_US
dc.publisherNISCAIR-CSIR, Indiaen_US
dc.rights CC Attribution-Noncommercial-No Derivative Works 2.5 Indiaen_US
dc.sourceIJPAP Vol.54(09) [September 2016]en_US
dc.subjectThin filmsen_US
dc.subjectArc dischargesen_US
dc.subjectNanoindentationen_US
dc.subjectNanomechanical propertiesen_US
dc.subjectFCVAen_US
dc.titleNanoindentation study on nitrogenated tetrahedral amorphous carbon thin films with ultra low loaden_US
dc.typeArticleen_US
Appears in Collections:IJPAP Vol.54(09) [September 2016]

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