NISCAIR Online Periodicals Repository

NISCAIR ONLINE PERIODICALS REPOSITORY (NOPR)  >
NISCAIR PUBLICATIONS >
Research Journals >
Indian Journal of Pure & Applied Physics (IJPAP) >
IJPAP Vol.47 [2009] >
IJPAP Vol.47(02) [February 2009] >


Title: Analysis of dielectric constants to determine sp³/sp² ratio and effect of substrate bias on spectroscopic ellipsometric studies of tetrahedral amorphous carbon films grown using an S bend filtered cathodic vacuum arc process
Authors: Panwar, O S
Khan, Mohd Alim
Basu, A
Kumar, Satyendra
Kumar, Sushil
Keywords: Spectroscopic ellipsometry
Optical constants
FCVA, sp³/sp²
ta-C
Substrate bias
Issue Date: Feb-2009
Publisher: CSIR
Abstract: The carbon bonding ratio and optical properties have been studied by spectroscopic ellipsometry of as grown tetrahedral amorphous carbon (ta-C) films, deposited using an S bend filtered cathodic vacuum arc (FCVA) process. First, the carbon bonding ratio in ta-C films has been estimated from imaginary part of dielectric constant (Ɛ₂) spectra obtained by spectroscopy ellipsometry. A method has been developed to find out the fractions of sp³ and sp² bonded carbon atoms from the Wemple-Didomenico plot. Second, the effect of varying negative substrate bias on the optical properties and sp³/sp² ratio of as-grown ta-C films has been made. The values of the optical constants evaluated are found to increase with the increase of the negative substrate bias in the as-grown ta-C films but the values of sp³/sp² ratio and the optical band gap (Eg) evaluated increase up to -200 V substrate bias and beyond -200 V substrate bias the values of sp³/sp² ratio and Eg decrease. Application of substrate bias is, thus, found to increase the sp³ bonding and Eg up to -200V substrate bias and beyond -200V substrate bias there is reversal of the trend.
Page(s): 141-148
ISSN: 0019-5596
Source:IJPAP Vol.47(02) [February 2009]

Files in This Item:

File Description SizeFormat
IJPAP 47(2) 141-148.pdf381.43 kBAdobe PDFView/Open
 Current Page Visits: 634 
Recommend this item

 

National Knowledge Resources Consortium |  NISCAIR Website |  Contact us |  Feedback

Disclaimer: NISCAIR assumes no responsibility for the statements and opinions advanced by contributors. The editorial staff in its work of examining papers received for publication is helped, in an honorary capacity, by many distinguished engineers and scientists.

CC License Except where otherwise noted, the Articles on this site are licensed under Creative Commons License: CC Attribution-Noncommercial-No Derivative Works 2.5 India

Copyright © 2012 The Council of Scientific and Industrial Research, New Delhi. All rights reserved.

Powered by DSpace Copyright © 2002-2007 MIT and Hewlett-Packard | Compliant to OAI-PMH V 2.0

Home Page Total Visits: 621146 since 06-Feb-2009  Last updated on 13-Nov-2014Webmaster: nopr@niscair.res.in