Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/30903
Title: Electrochemical behaviour of niobium and niobium passive films in nitric acid solutions
Authors: Badawy, W A
AI-Kharafi, F M
Issue Date: Mar-1997
Publisher: NISCAIR-CSIR, India
Abstract: Electrochemical behaviour of bare niobium and phosphoric acid anodized niobium electrodes is investigated in nitric acid solutions. Electrochemical impedance spectroscopy and polarization techniques have been used to investigate the open-circuit growth of the passive film. The stability of the anodic oxide film has been studied as a function of the formation voltage, formation current density and concentration of the ambient electrolyte. The results show that the Nb-Nb2O5-1M HNO3 does not behave as a perfect dielectric. The flat band potential and donor concentration of the semiconducting anodic oxide film have been calculated from the Mott-Schottky plots.
Page(s): 94-100
URI: http://hdl.handle.net/123456789/30903
ISSN: 0975-0991 (Online); 0971-457X (Print)
Appears in Collections:IJCT Vol.04(2) [March 1997]

Files in This Item:
File Description SizeFormat 
IJCT 4(2) 94-100.pdf1.59 MBAdobe PDFView/Open


Items in NOPR are protected by copyright, with all rights reserved, unless otherwise indicated.