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|Title:||Electrochemical behaviour of niobium and niobium passive films in nitric acid solutions|
|Authors:||Badawy, W A|
AI-Kharafi, F M
|Abstract:||Electrochemical behaviour of bare niobium and phosphoric acid anodized niobium electrodes is investigated in nitric acid solutions. Electrochemical impedance spectroscopy and polarization techniques have been used to investigate the open-circuit growth of the passive film. The stability of the anodic oxide film has been studied as a function of the formation voltage, formation current density and concentration of the ambient electrolyte. The results show that the Nb-Nb2O5-1M HNO3 does not behave as a perfect dielectric. The flat band potential and donor concentration of the semiconducting anodic oxide film have been calculated from the Mott-Schottky plots.|
|ISSN:||0975-0991 (Online); 0971-457X (Print)|
|Appears in Collections:||IJCT Vol.04(2) [March 1997]|
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