Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/29764
Title: Characterization of directly and indirectly oxidized thin indium films
Authors: Gopchandran, KG
Joseph, Benny
Abraham, Johny T
Koshy, Peter
Vaidyan, V K
Issue Date: Dec-1997
Publisher: NISCAIR-CSIR, India
Abstract: The structure and morphology of In2O3 films prepared by direct and indirect oxidation mechanisms are reported. XRD studies of In2O3 films prepared by annealing of vacuum deposited indium films have shown a <111> texture while the texture of reactively deposited (directly oxidized) films has been found sensitive to deposition conditions. SEM observations show porosity in films obtained by annealing and smooth polycrystalline nature for reactively deposited films. Electrical and optical properties of directly oxidized films are found to be superior to those of indirectly heated films.
Page(s): 282-286
URI: http://hdl.handle.net/123456789/29764
ISSN: 0975-1017 (Online); 0971-4588 (Print)
Appears in Collections:IJEMS Vol.04(6) [December 1997]

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