Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/2595
Full metadata record
DC FieldValueLanguage
dc.contributor.authorChowdhury, M Pal-
dc.contributor.authorDalui, S-
dc.contributor.authorChakraborty, B R-
dc.contributor.authorMukherjee, A-
dc.contributor.authorPal, A K-
dc.date.accessioned2008-12-15T09:05:42Z-
dc.date.available2008-12-15T09:05:42Z-
dc.date.issued2008-11-
dc.identifier.issn0019-5596-
dc.identifier.urihttp://hdl.handle.net/123456789/2595-
dc.description776-782en_US
dc.description.abstractBNC films have been deposited on Si (100) and fused silica substrates by inductively coupled plasma chemical vapour deposition (ICP-CVD) technique using a mixture of borane-ammonia, nitrogen and methane as precursor gases. Carbon content in the films is varied by changing the concentration of methane in the precursor gases. The films are amorphous in nature. The films, thus, deposited have been characterized by using Fourier Transform Infrared Spectroscopy (FTIR), X-ray diffraction and Secondary Ion Mass Spectroscopy (SIMS). Microstructural information has been obtained from SEM studies. Microhardness has been seen to decrease with the increase in carbon content and the highest microhardness observed in these films has been found to be ~5.3 GPa.en_US
dc.language.isoen_USen_US
dc.publisherCSIRen_US
dc.sourceIJPAP Vol.46(11)) [November 2008]en_US
dc.subjectBNC filmsen_US
dc.subjectHard coatingsen_US
dc.subjectChemical vapour depositionen_US
dc.titleEffect of carbon content on the mechanical properties of ternary boron-nitrogen-carbon compounden_US
dc.typeArticleen_US
Appears in Collections:IJPAP Vol.46(11) [November 2008]

Files in This Item:
File Description SizeFormat 
IJPAP 46(11) 776-782.pdf1.06 MBAdobe PDFView/Open


Items in NOPR are protected by copyright, with all rights reserved, unless otherwise indicated.