NISCAIR Online Periodicals Repository

Research Journals >
Indian Journal of Chemistry -Section A (IJC-A) >
IJC-A Vol.47A [2008] >
IJC-A Vol.47A(12) [December 2008] >

Title: Pattern formation and oscillatory electropolymerization of thiophene
Authors: Das, Ishwar
Agrawal, Namita Rani
Ansari, Shoeb A
Gupta, Sanjeev Kumar
Issue Date: Dec-2008
Publisher: CSIR
Abstract: Thiophene has been electrochemically polymerized using organic and inorganic oxidizing agents, 4-toluene sulphonic acid silver salt and perchloric acid, in the absence and presence of ZnSO₄. Electropolymerized aggregates have been characterized by morphological studies, growth kinetics, powder X-ray diffraction, differential scanning calorimetry, thermogravimetry and direct analysis in real time mass spectroscopy measurements. It is found that physical characteristics and morphology of polythiophene depend on the nature and concentration of the anion and field intensity. Morphologies of polymer aggregates using the silver salt of 4-toluene sulphonic acid and HClO₄ are fibrillar and compact respectively. Transitions in morphology have also been observed when doped with ZnSO₄. Growth kinetics during electropolymerization of thiophene has also been studied at different thiophene concentrations, field intensity, and concentrations of oxidizing agents as well as in the presence of ZnSO₄. Growth rate is found to be higher with HClO₄ than with 4-toluene sulphonic acid silver salt. Polymer obtained by using the silver salt is thermally more stable and of low molecular weight (416) than that obtained with HClO₄ (689). During electropolymerization, change in anode potential is observed and has been monitored as a function of time. Correlation between morphology and oscillatory behaviour has been studied.
Page(s): 1798-1803
ISSN: 0376-4710
Source: IJC-A Vol.47A(12) [December 2008]

Files in This Item:

File Description SizeFormat
IJCA 47A(12) 1798-1803.pdf478.03 kBAdobe PDFView/Open
 Current Page Visits: 1473 
Recommend this item


Online Submission of Articles |  NISCAIR Website |  National Knowledge Resources Consortium |  Contact us |  Feedback

Disclaimer: NISCAIR assumes no responsibility for the statements and opinions advanced by contributors. The editorial staff in its work of examining papers received for publication is helped, in an honorary capacity, by many distinguished engineers and scientists.

CC License Except where otherwise noted, the Articles on this site are licensed under Creative Commons License: CC Attribution-Noncommercial-No Derivative Works 2.5 India

Copyright © 2015 The Council of Scientific and Industrial Research, New Delhi. All rights reserved.

Powered by DSpace Copyright © 2002-2007 MIT and Hewlett-Packard | Compliant to OAI-PMH V 2.0

Home Page Total Visits: 170565 since 01-Sep-2015  Last updated on 30-Jun-2016Webmaster: