Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/2332
Title: MEMS prototyping using RF sputtered films
Authors: Chandra, Sudhir
Bhatt, Vivekanand
Singh, Ravindra
Sharma, Preeti
Pal, Prem
Keywords: RF sputtering;Dielectric films;Piezoelectric films;Perfect convex corner;MEMS microstructures
Issue Date: Apr-2007
Publisher: CSIR
IPC Code: G01L 9/06, B81B7/02
Abstract: In the present work, the deposition and characterization of dielectric, piezoelectric, semiconductor and conductor films by RF diode / RF magnetron sputtering process for applications in MEMS fabrication have been reported. Thin films of silicon dioxide, silicon nitride, amorphous silicon, zinc oxide and lanthanum doped lead zirconate titanate (PLZT) were prepared by RF sputtering process and extensively characterized for their structural, optical, and electrical properties. Thin films of conducting materials which are commonly used in MEMS fabrication (Cr, Au, Ti, and Pt) were also prepared by the same process. A few applications of these films in MEMS are demonstrated. It has been concluded that RF sputtering can be advantageously used for rapid prototyping of MEMS and demonstrating new ideas especially by researchers who do not have access to a well-established MEMS foundry.
Page(s): 326-331
URI: http://hdl.handle.net/123456789/2332
ISSN: 0019-5596
Appears in Collections:IJPAP Vol.45(04) [April 2007]

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