NISCAIR Online Periodicals Repository

Research Journals >
Indian Journal of Engineering and Materials Sciences (IJEMS) >
IJEMS Vol.15 [2008] >
IJEMS Vol.15(3) [June 2008] >

Title: Optical thin films of silica and titania deposited by plasma polymerisation process: System design and fabrication
Authors: Srivatsa, K M K
Bera, Mrinmoyee
Basu, A
Bhattacharya, T K
Keywords: Optical thin film
Plasma polymerization
Issue Date: Jun-2008
Publisher: CSIR
Abstract: Plasma polymerization provides a very versatile and cost-effective technique for the deposition of a wide variety of dielectric films, in particular optical thin films of silica (silicon dioxide) and titania (titanium dioxide) that are widely used as low and high index films in optical multilayer coatings for a variety of applications. The deposition of these films is often carried out using toxic and corrosive precursors–silane gas for silica and titanium tetrachloride liquid for titania – that are expensive and difficult to handle. The use of non-toxic organic liquid precursors, that are cheaper and safer and easier to handle, has been reported for the deposition of these films. In order to develop indigenous expertise in such deposition processes, a plasma polymerization deposition system that uses non-toxic and safe organic liquid precursors for the deposition of optical quality silica and titania films has been designed and fabricated in-house and successfully made operational. The problems that arise in this deposition process, the methods adopted to overcome them, the precautions that must be taken, have been studied in detail. Optical quality silica and titania films with satisfactory refractive indices and extinction coefficients have been deposited using this home-made deposition system.
Page(s): 265-274
ISSN: 0971-4588
Source: IJEMS Vol.15(3) [June 2008]

Files in This Item:

File Description SizeFormat
IJEMS 15(3) 265-274.pdf380.4 kBAdobe PDFView/Open
 Current Page Visits: 117 
Recommend this item


Online Submission of Articles |  NISCAIR Website |  National Knowledge Resources Consortium |  Contact us |  Feedback

Disclaimer: NISCAIR assumes no responsibility for the statements and opinions advanced by contributors. The editorial staff in its work of examining papers received for publication is helped, in an honorary capacity, by many distinguished engineers and scientists.

CC License Except where otherwise noted, the Articles on this site are licensed under Creative Commons License: CC Attribution-Noncommercial-No Derivative Works 2.5 India

Copyright © 2015 The Council of Scientific and Industrial Research, New Delhi. All rights reserved.

Powered by DSpace Copyright © 2002-2007 MIT and Hewlett-Packard | Compliant to OAI-PMH V 2.0

Home Page Total Visits: 166217 since 01-Sep-2015  Last updated on 28-Jun-2016Webmaster: