Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/16546
Title: Photocatalytic decomposition of acetaldehyde gas on TiO2-SiO2 thin film photocatalyst ― A kinetic analysis
Authors: Aziz, Radhiyah Abdul
Sopyan, Iis
Keywords: Acetaldehyde gas;Kinetic study;Sol-gel;TiO2-SiO2 photocatalyst;Thin film
Issue Date: Mar-2013
Publisher: NISCAIR-CSIR, India
Abstract: TiO2-SiO2 thin film photocatalysts with 5 (TF95/5) and 10 w/w% (TF90/10) SiO2 contents have been prepared via sol-gel method. Characterization using X-ray diffractormeter and field emission scanning electron microscopy is performed to investigate the effect of SiO2 doping on the TiO2 thin film’s physico-chemical properties. The photocatalytic performance of the thin films is evaluated using the degradation of acetaldehyde gas at various initial concentrations under fixed intensity UV irradiation. A Langmuir-Hinshelwood kinetic model is used to analyze the kinetics of the photocatalytic reaction. It is found that the first order reaction rate constant (k) of the TF95/5 thin film photocatalyst (1.2438 µmol dm-3 min-1) is higher than that of TF90/10 thin film (0.3648 µmol dm-3 min-1). This is attributed to higher crystallinity of the TF95/5 thin film, resulting in more active charge carrier generation. However, TF90/10 thin film photocatalyst with smaller TiO2 particles shows four times stronger adsorbability of acetaldehyde than TF95/5 due to its higher surface area.
Page(s): 137-144
URI: http://hdl.handle.net/123456789/16546
ISSN: 0975-0991 (Online); 0971-457X (Print)
Appears in Collections:IJCT Vol.20(2) [March 2013]

Files in This Item:
File Description SizeFormat 
IJCT 20(2) 137-144.pdf473.09 kBAdobe PDFView/Open


Items in NOPR are protected by copyright, with all rights reserved, unless otherwise indicated.