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Indian Journal of Pure & Applied Physics (IJPAP) >
IJPAP Vol.49 [2011] >
IJPAP Vol.49(11) [November 2011] >
| Title: | High density plasma beam source for nitriding |
| Authors: | Ganguli, B |
| Keywords: | Microwave plasma
Nitriding
X-ray diffraction
Microhardness
Iron nitride
Chromium nitride |
| Issue Date: | Nov-2011 |
| Publisher: | NISCAIR-CSIR, India |
| Abstract: | A high density
plasma beam source has been developed for the purpose of surface treatment and
study of low energy ions and neutrals with surfaces. The plasma is generated by
pulse microwave power at 2.45 GHz. A pair of Helmholtz coils is used for
generating axial magnetic field of 436 G which is also responsible for the
production of plasma inside a stainless steel tube of 26 mm internal diameter. The
plasma particles follow the axial magnetic field lines and hence, form a beam
of same diameter as the internal diameter of the SS tube. The current measured
by an interceptor plate (negatively biased) is about 60 mA while the plasma
density is determined to be approximately 1.1X1012 cm-3 at the center and falling off to about 1X1011 cm-3 at 1 cm away from the center. The plasma source using a mixture of
nitrogen and hydrogen (1:2) was used successfully to nitride a sample (diameter
16 mm) of SS201 at a low temperature of 400°C. The surface hardness achieved is rather high (1990 HV) which is
more than five-fold increase compared to untreated surface (358 HV). The depth
of the nitriding layer was found to be 26 microns. XRD results indicate
efficient conversion of chromium to chromium nitride by the high plasma density
of the present source accounting for the very efficient nitriding process. |
| Page(s): | 759-764 |
| CC License: |  CC Attribution-Noncommercial-No Derivative Works 2.5 India |
| ISSN: | 0975-1041 (Online); 0019-5596 (Print) |
| Source: | IJPAP Vol.49(11) [November 2011]
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