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JSIR Vol.70 [2011] >
JSIR Vol.70(04) [April 2011] >
| Title: | Deposition of TiAlSiN hard film by cathodic arc plasma evaporation using a single target combined with a shield filter |
| Authors: | Vinh, Pham Van
Ngoc, Tran Vu Diem |
| Keywords: | Cathodic arc plasma
Hardness
Scratch
Shield filter
Single TiAlSi alloy target
TiAlSiN
Wear |
| Issue Date: | Apr-2011 |
| Publisher: | NISCAIR-CSIR, India |
| Abstract: | Films of TiAlSiN were deposited on AISI H13 tool
steel substrate by a cathodic arc-plasma deposition system using a single
TiAlSi alloy as target. Presence of TiN crystal phase was found on films, but
no XRD peaks related to Al and Si were found. Hardness, morphology and
adhesion of films changed with different deposition parameters. Maximum
hardness (36.29GPa) of films was found on sample deposited at 300°C with 3x10‑3
Torr and cathode arc current of 45 A. |
| Page(s): | 273-277 |
| CC License: |  CC Attribution-Noncommercial-No Derivative Works 2.5 India |
| ISSN: | 0975-1084 (Online); 0022-4456 (Print) |
| Source: | JSIR Vol.70(04) [April 2011]
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