Please use this identifier to cite or link to this item:
Title: Deposition of TiAlSiN hard film by cathodic arc plasma evaporation using a single target combined with a shield filter
Authors: Vinh, Pham Van
Ngoc, Tran Vu Diem
Keywords: Cathodic arc plasma;Hardness;Scratch;Shield filter;Single TiAlSi alloy target;TiAlSiN;Wear
Issue Date: Apr-2011
Publisher: NISCAIR-CSIR, India
Abstract: Films of TiAlSiN were deposited on AISI H13 tool steel substrate by a cathodic arc-plasma deposition system using a single TiAlSi alloy as target. Presence of TiN crystal phase was found on films, but no XRD peaks related to Al and Si were found. Hardness, morphology and adhesion of films changed with different deposition parameters. Maximum hardness (36.29GPa) of films was found on sample deposited at 300°C with 3x10‑3 Torr and cathode arc current of 45 A.
Page(s): 273-277
ISSN: 0975-1084 (Online); 0022-4456 (Print)
Appears in Collections:JSIR Vol.70(04) [April 2011]

Files in This Item:
File Description SizeFormat 
JSIR 70(4) 273-277.pdf241.07 kBAdobe PDFView/Open

Items in NOPR are protected by copyright, with all rights reserved, unless otherwise indicated.