Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/11015
Title: Photodegradation of carboxylic acids on Al2O3 and SiO2 nanoparticles
Authors: Karunakaran, C
Dhanalakshmi, R
Manikandan, G
Gomathisankar, P
Keywords: Photochemistry;Catalysis;Photocatalysis;Photodegradation;Nanomaterials;Oxides;Semiconductors;Electrical properties;Alumina;Silica
Issue Date: Feb-2011
Publisher: NISCAIR-CSIR, India
Abstract: Al2O3 and SiO2 nanoparticles effect photodegradation of carboxylic acids, and their photonic efficiencies are comparable to those of TiO2 P25 Degussa, TiO2 Hombikat, TiO2 anatase, TiO2 rutile, ZnO, SnO2, and ZrO2 nanosemiconductors. All the nanoparticles show sustainable photoactivity and the degradation rates increase linearly with oxalic acid-concentration and photon flux. The photonic efficiencies of degradation are in the order: formic acid > oxalic acid > acetic acid > citric acid. The mechanism of photodegradation is discussed.
Page(s): 163-170
URI: http://hdl.handle.net/123456789/11015
ISSN: 0975-0975(Online); 0376-4710(Print)
Appears in Collections:IJC-A Vol.50A(02) [February 2011]

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