Please use this identifier to cite or link to this item: http://nopr.niscair.res.in/handle/123456789/11015
Title: Photodegradation of carboxylic acids on Al<sub>2</sub>O<sub>3</sub> and SiO<sub>2</sub> nanoparticles
Authors: Karunakaran, C
Dhanalakshmi, R
Manikandan, G
Gomathisankar, P
Keywords: Photochemistry
Catalysis
Photocatalysis
Photodegradation
Nanomaterials
Oxides
Semiconductors
Electrical properties
Alumina
Silica
Issue Date: Feb-2011
Publisher: NISCAIR-CSIR, India
Abstract: Al<sub>2</sub>O<sub>3</sub> and SiO<sub>2</sub> nanoparticles effect photodegradation of carboxylic acids, and their photonic efficiencies are comparable to those of TiO<sub>2</sub> P25 Degussa, TiO<sub>2</sub> Hombikat, TiO<sub>2</sub> anatase, TiO<sub>2</sub> rutile, ZnO, SnO<sub>2</sub>, and ZrO<sub>2</sub> nanosemiconductors. All the nanoparticles show sustainable photoactivity and the degradation rates increase linearly with oxalic acid-concentration and photon flux. The photonic efficiencies of degradation are in the order: formic acid > oxalic acid > acetic acid > citric acid. The mechanism of photodegradation is discussed.
Description: 163-170
URI: http://hdl.handle.net/123456789/11015
ISSN: 0975-0975(Online); 0376-4710(Print)
Appears in Collections:IJC-A Vol.50A(02) [February 2011]

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