NISCAIR Online Periodicals Repository

Research Journals >
Indian Journal of Pure & Applied Physics (IJPAP) >
IJPAP Vol.48 [2010] >
IJPAP Vol.48(10) [October 2010] >

Title: Characterization of low pressure plasma-dc glow discharges (Ar, SF6 and SF6/He) for Si etching
Authors: T Chiad, Bahaa
L Al-zubaydib, Thair
Khalaf, Mohammad K
I Khudiar, Ausama
Keywords: Plasma etching
Si etching
Dry etching
SF6 discharge
Glow discharge
Issue Date: Oct-2010
Publisher: NISCAIR-CSIR, India
Abstract: Low-pressure plasma reactor which is generated for SF6, SF6/He and Ar gases discharges between two metal electrodes (planer –parallel) using dc-high voltage power supply of 2 kV has been proposed. Paschen’s curves show the breakdown voltage of gases as a function of the parameter p*d which is the product of the pressure in the chamber (P=6.5´10-2-1.5´10-1 mbar) and the distance between the two electrodes (d=4.6 cm). The minimum breakdown voltages were found 450 V at pressure of 1.35´10-1mbar and 276 V at pressure of 4.3´10-1 mbar for SF6 and Ar, respectively. Current-voltage characteristics have been studied at different values of pressure (6.5´10-2-1.5´10-1 mbar) and inter-electrodes spacing (3.4, 4.2, 4.6, 5 cm). The SF6, SF6/He and Ar gases discharges plasmas in Si etching have been discussed
Page(s): 723-730
CC License:  CC Attribution-Noncommercial-No Derivative Works 2.5 India
ISSN: 0975-1041 (Online); 0019-5596 (Print)
Source:IJPAP Vol.48(10) [October 2010]

Files in This Item:

File Description SizeFormat
IJPAP 48(10) 723-730.pdf593.06 kBAdobe PDFView/Open
 Current Page Visits: 1197 
Recommend this item


Online Submission of Articles |  NISCAIR Website |  National Knowledge Resources Consortium |  Contact us |  Feedback

Disclaimer: NISCAIR assumes no responsibility for the statements and opinions advanced by contributors. The editorial staff in its work of examining papers received for publication is helped, in an honorary capacity, by many distinguished engineers and scientists.

CC License Except where otherwise noted, the Articles on this site are licensed under Creative Commons License: CC Attribution-Noncommercial-No Derivative Works 2.5 India

Copyright © 2015 The Council of Scientific and Industrial Research, New Delhi. All rights reserved.

Powered by DSpace Copyright © 2002-2007 MIT and Hewlett-Packard | Compliant to OAI-PMH V 2.0

Home Page Total Visits: 162650 since 01-Sep-2015  Last updated on 21-Jun-2016Webmaster: