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    <title>NISCAIR Online Periodicals Repository Collection: IJPAP Vol.43(04) [April 2005]</title>
    <link>http://nopr.niscair.res.in/handle/123456789/8608</link>
    <description />
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        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/8752" />
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        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/8750" />
        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/8743" />
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    <title>The Collection's search engine</title>
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  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/8752">
    <title>Study of NMR spin lattice relaxation of several aldehydes</title>
    <link>http://nopr.niscair.res.in/handle/123456789/8752</link>
    <description>Title: Study of NMR spin lattice relaxation of several aldehydes
&lt;br/&gt;
&lt;br/&gt;Authors: Vaish, S K; Singh, Anupam; Singh, A K; Mehrotra, N K
&lt;br/&gt;
&lt;br/&gt;Abstract: The NMR spin lattice relaxation of various aldehydes has been&#xD;
investigated.The experimental values of NMR spin lattice relaxation time &lt;i style=""&gt;T&lt;/i&gt;1 of benzaldehyde, anisaldehyde, &lt;i style=""&gt;o&lt;/i&gt;-cholorobenzaldehyde and &lt;i style=""&gt;p&lt;/i&gt;-hydroxybenzaldehyde have been&#xD;
correlated with the calculated value of N M R spin lattice relaxation time &lt;i style=""&gt;T&lt;/i&gt;1 obtained using various equations for&#xD;
dielectric relaxation time t. It has&#xD;
been concluded that Writz equation and Murty equation are better substitute for&#xD;
the correlation time in calculating NMR spin lattice relaxation time than Debye&#xD;
equation as used by BPP (Bloembergen, Purcell and Pound).
&lt;br/&gt;
&lt;br/&gt;Page(s): 295-300</description>
  </item>
  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/8751">
    <title>Point contact one injection current in solid insulators with traps</title>
    <link>http://nopr.niscair.res.in/handle/123456789/8751</link>
    <description>Title: Point contact one injection current in solid insulators with traps
&lt;br/&gt;
&lt;br/&gt;Authors: Sharma, N K; Anbarasan, P M
&lt;br/&gt;
&lt;br/&gt;Abstract: One injection current in insulator&#xD;
has been studied widely for a long time in various geometries. An important&#xD;
field for study is the analytical treatment of current carriers in deep trap&#xD;
region well below the fermi level. In the present problem, a cylindrical&#xD;
structure has been taken into consideration. The effects of traps are included&#xD;
in the analysis. The problem becomes complicated in the presence of traps and&#xD;
thermal free carriers because there are various transitions regimes present in&#xD;
the complete current-voltage characteristics.
&lt;br/&gt;
&lt;br/&gt;Page(s): 308-310</description>
  </item>
  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/8750">
    <title>Novel power VDMOSFET structure with vertical floating islands and trench gate</title>
    <link>http://nopr.niscair.res.in/handle/123456789/8750</link>
    <description>Title: Novel power VDMOSFET structure with vertical floating islands and trench gate
&lt;br/&gt;
&lt;br/&gt;Authors: Vaid, Rakesh; Padha, Naresh
&lt;br/&gt;
&lt;br/&gt;Abstract: A novel power VDMOSFET (vertical double-diffused&#xD;
MOSFET) structure, simulated using PISCES-II, a 2-dimensional numerical device&#xD;
simulator has been described. The proposed device structure is based on the&#xD;
floating islands (FLI)-diode concept and trench gate technology. Extensive&#xD;
simulations were performed to understand physics of the device through various&#xD;
internal electrical quantities like potential distribution, electric field,&#xD;
etc. in different regions of the device both in on/off states.The simulation&#xD;
results show that the new device has a low on-resistance by virtue of reduced&#xD;
electric field in its drift region as well as due to the removal of parasitic&#xD;
JFET region resistance. Trench gate acts as a field plate to avoid the&#xD;
punch-through thus enhancing the breakdown voltage. For a 100 Volts design, an&#xD;
approximate 15% increase in the breakdown voltage has been observed in the&#xD;
proposed device compared to the conventional FLIMOSFET without trench gate.
&lt;br/&gt;
&lt;br/&gt;Page(s): 301-307</description>
  </item>
  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/8743">
    <title>Effect of processing and polarizer on the electrical properties of Mn-Zn ferrites</title>
    <link>http://nopr.niscair.res.in/handle/123456789/8743</link>
    <description>Title: Effect of processing and polarizer on the electrical properties of Mn-Zn ferrites
&lt;br/&gt;
&lt;br/&gt;Authors: Lal, Madan; Sharma, D K; Singh, M
&lt;br/&gt;
&lt;br/&gt;Abstract: The effect of&#xD;
processing technique as well as the effect of oxidizing agent on the electrical&#xD;
properties of Mn&lt;sub&gt;0.47&lt;/sub&gt;Zn&lt;sub&gt;0.53&lt;/sub&gt;Fe&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;4&lt;/sub&gt; ferrite&#xD;
has been presented. The dc resistivity is improved by citrate precursor method&#xD;
as compared to normal ceramic method and it is further improved by the addition&#xD;
of H&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;2 &lt;/sub&gt;(hydrogen peroxide), which acts as a strong&#xD;
oxidizing agent. The decrease in dielectric constant and dielectric loss factor&#xD;
by addition of oxidizing agent is justified by inverse proportionality between&#xD;
resistivity and dielectric constant.
&lt;br/&gt;
&lt;br/&gt;Page(s): 291-294</description>
  </item>
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