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    <title>NISCAIR Online Periodicals Repository Collection: IJPAP Vol.44(01) [January 2006]</title>
    <link>http://nopr.niscair.res.in/handle/123456789/8200</link>
    <description />
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        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/8240" />
        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/8239" />
        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/8238" />
        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/8237" />
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    <title>The Collection's search engine</title>
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  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/8240">
    <title>Realization of multi-function biquad filter using operational transconductance amplifier</title>
    <link>http://nopr.niscair.res.in/handle/123456789/8240</link>
    <description>Title: Realization of multi-function biquad filter using operational transconductance amplifier
&lt;br/&gt;
&lt;br/&gt;Authors: Kumar, K; Pal, K; Gupta, G K
&lt;br/&gt;
&lt;br/&gt;Abstract: A configuration&#xD;
of voltage mode (VM) multi-function biquad filters (MBF) is presented in this&#xD;
paper. The configuration (MBF) is implemented by using two OTAs (one dual&#xD;
output and other single output) and two capacitors. It realises all standard&#xD;
filtering functions i.e. low pass (LP), high pass (HP), band pass (BP), notch&#xD;
and all pass (AP). This configuration (MBF) can also be constructed using a&#xD;
single OTA, two capacitors and one resistor. It employs minimum of active and&#xD;
passive components and provides an attractive feature in case of BP filter that&#xD;
it can be designed for high Q. In addition, the circuit enjoy low sensitivity&#xD;
performance. The experimental results that confirm the validity of the circuit&#xD;
are included.
&lt;br/&gt;
&lt;br/&gt;Page(s): 71-74</description>
  </item>
  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/8239">
    <title>Surface chemical etching behaviour of pristine and high energy Li ion irradiated kapton-H polyimide</title>
    <link>http://nopr.niscair.res.in/handle/123456789/8239</link>
    <description>Title: Surface chemical etching behaviour of pristine and high energy Li ion irradiated kapton-H polyimide
&lt;br/&gt;
&lt;br/&gt;Authors: Garg, Maneesha; Sharma, Anu; Quamara, J K
&lt;br/&gt;
&lt;br/&gt;Abstract: &lt;smarttagtype namespaceuri="urn:schemas-microsoft-com:office:smarttags" name="City"&gt;&lt;smarttagtype namespaceuri="urn:schemas-microsoft-com:office:smarttags" name="PlaceType"&gt;&lt;smarttagtype namespaceuri="urn:schemas-microsoft-com:office:smarttags" name="PlaceName"&gt;&lt;smarttagtype namespaceuri="urn:schemas-microsoft-com:office:smarttags" name="place"&gt;&#xD;
&#xD;
&#xD;
&#xD;
High energy heavy&#xD;
ion irradiation effect on surface chemical etching behaviour of kapton-H&#xD;
polyimide has been studied using NaOH (40°C) and NaOCl (55°C) as etchants. The&#xD;
samples have been irradiated with 50 MeV Li ions (fluence 10&lt;sup&gt;5&lt;/sup&gt;&#xD;
ions/cm&lt;sup&gt;2&lt;/sup&gt; at Pelletron Facility, Nuclear&#xD;
Science Center,&#xD;
New Delhi). The&#xD;
etching behaviour is non-linear in NaOH for both pristine and irradiated&#xD;
samples. There is an enhancement in the etching rate in irradiated samples for&#xD;
both NaOH and NaOCl etchants. The etching mechanism of pristine and irradiated&#xD;
kapton-H polyimide with NaOCl and NaOH has been investigated. In irradiated&#xD;
samples the demerization of carbonyl groups, breaking of imide linkages and&#xD;
increase in crystallinity have been held responsible for the change in the&#xD;
etching behaviour. The bulk activation energy of pristine and irradiated&#xD;
samples for NaOH (0.38 and 0.30 eV) and NaOCl (1.6 and 1.3 eV) has been&#xD;
estimated. High temperature vacuum annealed samples when etched with NaOH show&#xD;
swelling instead of etching, which is due to a unique type of gel formation&#xD;
taking place on the surface.&#xD;
&#xD;
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&lt;br/&gt;
&lt;br/&gt;Page(s): 66-70</description>
  </item>
  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/8238">
    <title>Dielectric relaxation in glassy Se&lt;sub&gt;70&lt;/sub&gt;Te&lt;sub&gt;30-x&lt;/sub&gt;Ag&lt;sub&gt;x&lt;/sub&gt;</title>
    <link>http://nopr.niscair.res.in/handle/123456789/8238</link>
    <description>Title: Dielectric relaxation in glassy Se&lt;sub&gt;70&lt;/sub&gt;Te&lt;sub&gt;30-x&lt;/sub&gt;Ag&lt;sub&gt;x&lt;/sub&gt;
&lt;br/&gt;
&lt;br/&gt;Authors: Choudhary, N; Kumar, A
&lt;br/&gt;
&lt;br/&gt;Abstract: Temperature dependence of dielectric constant (e')and dielectric loss (e") are studied in glassy  Se&lt;sub&gt;70&lt;/sub&gt;Te&lt;sub&gt;30-x&lt;/sub&gt;Ag&lt;sub&gt;x&lt;/sub&gt;where &lt;i style=""&gt;x&lt;/i&gt; is varied from 0 to 10 in the&#xD;
frequency range 1&lt;sub&gt; &lt;/sub&gt;to 10 kHz and temperature range 300-350 K. The&#xD;
results indicate that the dielectric dispersion exists in the above frequency&#xD;
and temperature range. Loss peaks in  e"&#xD;
versus &lt;i style=""&gt;T&lt;/i&gt; curve could be observed in&#xD;
ternary Se&lt;sub&gt;70&lt;/sub&gt;Te&lt;sub&gt;30-x&lt;/sub&gt;Ag&lt;sub&gt;x&lt;/sub&gt; alloys. However, such&#xD;
loss peaks could not be observed in binary Se&lt;sub&gt;70&lt;/sub&gt;Te&lt;sub&gt;30&lt;/sub&gt;&#xD;
alloy, which indicates that Ag incorporation in binary system, is responsible&#xD;
for such behaviour. This is explained in terms of [(D&lt;sup&gt;-&lt;/sup&gt;) (Ag&lt;sup&gt;+&lt;/sup&gt;)]&#xD;
dipoles which otherwise were not present in the undoped samples.
&lt;br/&gt;
&lt;br/&gt;Page(s): 62-65</description>
  </item>
  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/8237">
    <title>Electronic properties of CdS, CdSe and CdTe semiconductor binary alloys</title>
    <link>http://nopr.niscair.res.in/handle/123456789/8237</link>
    <description>Title: Electronic properties of CdS, CdSe and CdTe semiconductor binary alloys
&lt;br/&gt;
&lt;br/&gt;Authors: Jivani, A R; Trivedi, H J; Gajjar, P N; Jani, A R
&lt;br/&gt;
&lt;br/&gt;Abstract: The higher-order perturbation theory based&#xD;
on pseudopotential is used to calculate total energy, band gap at Jones-zone&#xD;
face and bulk modulus of CdS, CdSe and CdTe binary semiconductor compounds. The&#xD;
covalent correction term, which is approximately equal to third and&#xD;
fourth-order perturbation energy, is used in the present study. The ratio of&#xD;
covalent bond correction energy to second-order perturbation energy is about&#xD;
15% and hence it is essential to study the electronic properties of&#xD;
semiconductor materials. Present theoretical results are found better than&#xD;
other available theoretical findings and good agreements of present finding of&#xD;
total energy, band gap at Jones-zone face and bulk modulus with the&#xD;
experimental data are achieved.
&lt;br/&gt;
&lt;br/&gt;Page(s): 59-61</description>
  </item>
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