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    <title>NISCAIR Online Periodicals Repository Collection: IJPAP Vol.50(09) [September 2012]</title>
    <link>http://nopr.niscair.res.in/handle/123456789/14562</link>
    <description />
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        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/14591" />
        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/14590" />
        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/14589" />
        <rdf:li resource="http://nopr.niscair.res.in/handle/123456789/14588" />
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    <title>The Collection's search engine</title>
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    <link>http://nopr.niscair.res.in/simple-search</link>
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  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/14591">
    <title>Energy balance method and amplitude frequency formulation based  simulation of strongly non-linear oscillators</title>
    <link>http://nopr.niscair.res.in/handle/123456789/14591</link>
    <description>Title: Energy balance method and amplitude frequency formulation based  simulation of strongly non-linear oscillators
&lt;br/&gt;
&lt;br/&gt;Authors: Ganji, Davood D; Azimi, Mohammadreza; Mostofi, Mehdi
&lt;br/&gt;
&lt;br/&gt;Abstract: The Energy Balance&#xD;
Method (EBM) and Amplitude Frequency Formulation (AFF) have been applied to&#xD;
derive the approximate analytical solution for motion of two mechanical&#xD;
oscillators. In first problem both methods yield the same result but in the&#xD;
second problem, the results which are obtained from Amplitude Frequency&#xD;
Formulation and Energy Balance Method are different. In comparison with the&#xD;
forth order Runge-Kutta method, the results show that these methods are very&#xD;
convenient for solving non-linear equations and also can be used for strong non-linear&#xD;
oscillators.
&lt;br/&gt;
&lt;br/&gt;Page(s): 670-675</description>
  </item>
  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/14590">
    <title>Effects of grain boundaries on the performance of  polycrystalline silicon solar cells</title>
    <link>http://nopr.niscair.res.in/handle/123456789/14590</link>
    <description>Title: Effects of grain boundaries on the performance of  polycrystalline silicon solar cells
&lt;br/&gt;
&lt;br/&gt;Authors: Joshi, D P; Sharma, Kiran
&lt;br/&gt;
&lt;br/&gt;Abstract: A comprehensive&#xD;
carrier recombination model under optical illumination near grain boundaries&#xD;
(GBs) is proposed by considering the asymmetric Gaussian energy distribution of&#xD;
GB interface states model. A new recombination velocity &lt;i style="mso-bidi-font-style:&#xD;
normal"&gt;S&lt;/i&gt;(&lt;i style="mso-bidi-font-style:normal"&gt;L&lt;sub&gt;n&lt;/sub&gt;&lt;/i&gt;) is&#xD;
proposed to study the dependence of effective diffusion length of minority&#xD;
carriers on grain size and GB interface state density. The dependence of GB&#xD;
space charge potential barrier height (&lt;i style="mso-bidi-font-style:normal"&gt;qV&lt;sub&gt;g&lt;/sub&gt;&lt;/i&gt;),&#xD;
the recombination velocities, and polycrystalline silicon (PX-Si) solar cell&#xD;
parameters on grain size, illumination level, and GB interface state density&#xD;
have also been studied. It is observed that the efficiency of solar cells is&#xD;
mainly determined by the potential barrier height &lt;i style="mso-bidi-font-style:&#xD;
normal"&gt;qV&lt;sub&gt;g&lt;/sub&gt;&lt;/i&gt;. Considering the effect of vertical GBs in the&#xD;
junction depletion region of a solar cell, it is also observed that their&#xD;
effect is smaller in the small grain size range as compared to that in the&#xD;
large grain size range. A reasonably good agreement is obtained between the&#xD;
theoretical predictions and the available experimental data.
&lt;br/&gt;
&lt;br/&gt;Page(s): 661-669</description>
  </item>
  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/14589">
    <title>Thickness dependent electrical and optical properties of nanocrystalline copper sulphide thin films grown by simple chemical route</title>
    <link>http://nopr.niscair.res.in/handle/123456789/14589</link>
    <description>Title: Thickness dependent electrical and optical properties of nanocrystalline copper sulphide thin films grown by simple chemical route
&lt;br/&gt;
&lt;br/&gt;Authors: Shinde, M S; Ahirrao, P B; Patil, I J; Patil, R S
&lt;br/&gt;
&lt;br/&gt;Abstract: A Novel chemical&#xD;
bath deposition (CBD) method has been developed to deposit semiconducting&#xD;
nanocrystalline copper sulphide (Cu&lt;sub&gt;2&lt;/sub&gt;S) thin films on ordinary glass&#xD;
substrates with different thicknesses. The deposition bath consists of aqueous&#xD;
copper chloride (CuCl&lt;sub&gt;2&lt;/sub&gt;), ammonia (NH&lt;sub&gt;3&lt;/sub&gt;) and thiourea [SC(NH&lt;sub&gt;2&lt;/sub&gt;)&lt;sub&gt;2&lt;/sub&gt;].&#xD;
It is found that the deposition parameters significantly influence the quality&#xD;
and the thickness of Cu&lt;sub&gt;2&lt;/sub&gt;S films. The films were uniform and adherent&#xD;
to glass substrates. The deposited films have been characterized by X-ray&#xD;
diffraction (XRD), Scanning electron microscope (SEM), optical absorption and&#xD;
electrical resistivity. The effect of film thickness on the optical, structural&#xD;
and electrical properties has been studied. The shift of 0.46 eV in the optical&#xD;
band gap energy (&lt;i style="mso-bidi-font-style:normal"&gt;E&lt;sub&gt;g&lt;/sub&gt;&lt;/i&gt;) and&#xD;
decrease in electrical resistivity from 6.463 &lt;span style="font-family:Symbol;mso-ascii-font-family:" times="" new="" roman";mso-hansi-font-family:="" "times="" roman";mso-char-type:symbol;mso-symbol-font-family:symbol"="" lang="EN-GB"&gt;&lt;img src='/image/spc_char/cross.gif' border=0&gt; 10&lt;sup&gt;&lt;span style="font-family:Symbol;&#xD;
mso-ascii-font-family:" times="" new="" roman";mso-hansi-font-family:"times="" roman";="" mso-char-type:symbol;mso-symbol-font-family:symbol"="" lang="EN-GB"&gt;-2 &lt;/span&gt;&lt;/sup&gt;to 8.973 &lt;span style="font-family:Symbol;&#xD;
mso-ascii-font-family:" times="" new="" roman";mso-hansi-font-family:"times="" roman";="" mso-char-type:symbol;mso-symbol-font-family:symbol"="" lang="EN-GB"&gt;&lt;img src='/image/spc_char/cross.gif' border=0&gt; 10&lt;sup&gt;&lt;span style="font-family:Symbol;mso-ascii-font-family:" times="" new="" roman";="" mso-hansi-font-family:"times="" roman";mso-char-type:symbol;mso-symbol-font-family:="" symbol"="" lang="EN-GB"&gt;-3&lt;/span&gt;&lt;/sup&gt; &lt;span style="mso-ansi-language:EL" lang="EL"&gt;Ω-cm and increase in the&#xD;
grain size of Cu&lt;sub&gt;2&lt;/sub&gt;S crystallites from 30 to 250 nm were observed when&#xD;
the film thickness was varied from 130 to 250 nm. &#xD;
&#xD;
&lt;/span&gt;&lt;/span&gt;&lt;/span&gt;
&lt;br/&gt;
&lt;br/&gt;Page(s): 657-660</description>
  </item>
  <item rdf:about="http://nopr.niscair.res.in/handle/123456789/14588">
    <title>&lt;span style="font-size:10.0pt;font-family: "Times New Roman";mso-fareast-font-family:"Times New Roman";mso-bidi-font-family: Mangal;mso-ansi-language:EN-US;mso-fareast-language:EN-US;mso-bidi-language: HI" lang="EN-US"&gt;Surface modification of GaAs induced by argon ion implantation&lt;/span&gt;</title>
    <link>http://nopr.niscair.res.in/handle/123456789/14588</link>
    <description>Title: &lt;span style="font-size:10.0pt;font-family: "Times New Roman";mso-fareast-font-family:"Times New Roman";mso-bidi-font-family: Mangal;mso-ansi-language:EN-US;mso-fareast-language:EN-US;mso-bidi-language: HI" lang="EN-US"&gt;Surface modification of GaAs induced by argon ion implantation&lt;/span&gt;
&lt;br/&gt;
&lt;br/&gt;Authors: Hussain, S; Gayen, R N; Dutt, M B; Pal, A K
&lt;br/&gt;
&lt;br/&gt;Abstract: Surface modification&#xD;
of GaAs (100) due to Ar&lt;sup&gt;+&lt;/sup&gt; ion bombardment has been studied by&#xD;
measuring optical, AFM, SEM, Raman and PL measurements. GaAs was bombarded with&#xD;
250 keV argon ions with three different doses of 1×10&lt;sup&gt;16&lt;/sup&gt; cm&lt;sup&gt;&lt;span style="font-family:Symbol;mso-ascii-font-family:" times="" new="" roman";="" mso-hansi-font-family:"times="" roman";mso-char-type:symbol;mso-symbol-font-family:="" symbol"="" lang="EN-GB"&gt;-2&lt;/span&gt;&lt;/sup&gt;, 1×10&lt;sup&gt;15&lt;/sup&gt; cm&lt;sup&gt;&lt;span style="font-family:Symbol;mso-ascii-font-family:" times="" new="" roman";="" mso-hansi-font-family:"times="" roman";mso-char-type:symbol;mso-symbol-font-family:="" symbol"="" lang="EN-GB"&gt;-2 &lt;/span&gt;&lt;/sup&gt;and 1×10&lt;sup&gt;14&lt;/sup&gt;&lt;b style="mso-bidi-font-weight:normal"&gt; &lt;/b&gt;cm&lt;sup&gt;&lt;span style="font-family:Symbol;mso-ascii-font-family:" times="" new="" roman";mso-hansi-font-family:="" "times="" roman";mso-char-type:symbol;mso-symbol-font-family:symbol"="" lang="EN-GB"&gt;-2&lt;/span&gt;&lt;/sup&gt;. AFM studies indicated that the&#xD;
surface became rougher with ion bombardment (dose) and the surface roughness&#xD;
increased from 0.706 nm for un-bombarded GaAs to 3.671 nm for bombarded&#xD;
samples. Peaks shifted to lower 2θ values for bombarded samples. The full width&#xD;
at half maxima (FWHM) of the XRD peaks for reflections from (200) and (400)&#xD;
planes of GaAs increased for films bombarded with increased Ar&lt;sup&gt;+&lt;/sup&gt;&#xD;
fluxes and increase in FWHM for (400) plane peak is quite significant. The LO&#xD;
peak at ~290 cm&lt;sup&gt;&lt;span style="font-family:Symbol;&#xD;
mso-ascii-font-family:" times="" new="" roman";mso-hansi-font-family:"times="" roman";="" mso-char-type:symbol;mso-symbol-font-family:symbol"="" lang="EN-GB"&gt;-1&lt;/span&gt;&lt;/sup&gt; of the Raman spectra shifted to lower wave number and became&#xD;
broader with the Ar&lt;sup&gt;+&lt;/sup&gt; flux. PL spectra showed a strong luminescence&#xD;
peak at ~ 1.5 eV followed by two smaller peaks located at ~1.40 eV and 1.1 eV.&#xD;
Photoluminescence bands at ~ 1.5 eV band were assigned to annihilation of free&#xD;
and localized excitons by small donors and acceptors. The shoulders at ~1.48 eV&#xD;
and ~1.47 eV represented the transition due to free-to-bound recombination and&#xD;
the defects GaAs.
&lt;br/&gt;
&lt;br/&gt;Page(s): 650-656</description>
  </item>
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